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Cited article:

24% Single‐Junction GaAs Solar Cell Grown Directly on Growth‐Planarized Facets Using Hydride Vapor Phase Epitaxy

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Advanced Energy Materials 14 (3) (2024)
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Selective Area Growth of GaAs Nanowires and Microplatelet Arrays on Silicon by Hydride Vapor-Phase Epitaxy

Mohammed Zeghouane, Gabin Grégoire, Emmanuel Chereau, et al.
Crystal Growth & Design 23 (4) 2120 (2023)
https://doi.org/10.1021/acs.cgd.2c01105

High growth rate hydride vapor phase epitaxy at low temperature through use of uncracked hydrides

Kevin L. Schulte, Anna Braun, John Simon and Aaron J. Ptak
Applied Physics Letters 112 (4) (2018)
https://doi.org/10.1063/1.5013136

A model for arsenic anti-site incorporation in GaAs grown by hydride vapor phase epitaxy

K. L. Schulte and T. F. Kuech
Journal of Applied Physics 116 (24) (2014)
https://doi.org/10.1063/1.4904745

James Friend, H. Hoe Tan, Yamina André, Agnès Trassoudaine, Geoffrey Avit, Kaddour Lekhal, Mohammed R. Ramdani, Christine Leroux, Guillaume Monier, Christelle Varenne, Philip Hoggan, Dominique Castelluci, Catherine Bougerol, François Réveret, Joël Leymarie, Elodie Petit, Vladimir G. Dubrovskii and Evelyne Gil
8923 89230O (2013)
https://doi.org/10.1117/12.2035485

A computational study of gas-phase and surface reactions in deposition and etching of GaAs and AlAs in the presence of HCl

Carlo Cavallotti, Istvan Lengyel, Maria Nemirovskaya and Klavs F. Jensen
Journal of Crystal Growth 268 (1-2) 76 (2004)
https://doi.org/10.1016/j.jcrysgro.2004.04.033

Temperature influence on the growth of gallium nitride by HVPE in a mixed H2/N2 carrier gas

Agnès Trassoudaine, Robert Cadoret and Evelyne Gil-Lafon
Journal of Crystal Growth 260 (1-2) 7 (2004)
https://doi.org/10.1016/j.jcrysgro.2003.07.027

Two-particle surface diffusion-reaction models of vapour-phase epitaxial growth on vicinal surfaces

Alberto Pimpinelli, Robert Cadoret, Evelyne Gil-Lafon, Jérôme Napierala and Agnès Trassoudaine
Journal of Crystal Growth 258 (1-2) 1 (2003)
https://doi.org/10.1016/S0022-0248(03)01310-1

Direct condensation modelling for a two-particle growth system: application to GaAs grown by hydride vapour phase epitaxy

E Gil-Lafon, J Napierala, A Pimpinelli, et al.
Journal of Crystal Growth 258 (1-2) 14 (2003)
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Influence of the partial pressure of GaCl3 in the growth process of GaN by HVPE under nitrogen

E Aujol, A Trassoudaine, D Castelluci and R Cadoret
Materials Science and Engineering: B 82 (1-3) 65 (2001)
https://doi.org/10.1016/S0921-5107(00)00725-X

Selective growth of GaAs by HVPE: keys for accurate control of the growth morphologies

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Journal of Crystal Growth 222 (3) 482 (2001)
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Hydrogen and nitrogen ambient effects on epitaxial growth of GaN by hydride vapour phase epitaxy

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Growth mechanisms of (00.1)GaN substrates in the hydride vapour-phase method: surface diffusion, spiral growth, H2 and GaCl3 mechanisms

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Journal of Crystal Growth 205 (1-2) 123 (1999)
https://doi.org/10.1016/S0022-0248(99)00251-1

Kinetic Modelling Of The Selective Epitaxy Of GaAs On Patterned Substrates By Hvpe. Application to the Conformal Growth Of Low Defect Density GaAs Layers On Silicon

E. Gil-Lafon, J. Napierala, D. Castelluci, et al.
MRS Proceedings 535 (1998)
https://doi.org/10.1557/PROC-535-33