| Numéro |
J. Phys. I France
Volume 5, Numéro 4, April 1995
|
|
|---|---|---|
| Page(s) | 443 - 449 | |
| DOI | https://doi.org/10.1051/jp1:1995137 | |
J. Phys. I France 5 (1995) 443-449
A Reflection Electron Microscopy Investigation of the Divergence of the Mean Correlated Difference of Step Displacements on a Si(111) Vicinal Surface
J.C. Heyraud, J.M. Bermond, C. Alfonso and J.J. MétoisCRMC2-CNRS, Campus Luminy, Case 913, 13288 Marseille Cedex 09, France
(Received 21 December 1994, accepted 24 January 1995)
Abstract
A Si(111) vicinal (misorientation
) is studied by in situ Reflection Electron
Microscopy at 1173 K. A statistical study is done of the distances between pairs of
neighbours in a step train. The mean correlated difference of the step displacements from their mean
positions
G(m)=<(ui-ui+m)2> is determined as a function of
m. Evidence is given for the
roughness of the surface. A logarithmic behaviour of
G(m) versus
m is demonstrated
unambiguously up to
m=7. Quantitative agreement is found with the theoretical predictions of
Villain, Grempel and Lapujoulade. For more distant pairs of steps a different behaviour is
demonstrated:
G(m) increases faster than Log
(m), a fact already found by another author.
© Les Editions de Physique 1995