J. Phys. I France
Volume 3, Numéro 7, July 1993
Page(s) 1585 - 1603
DOI: 10.1051/jp1:1993202
J. Phys. I France 3 (1993) 1585-1603

Low-energy cluster beam deposition : do you need it ?

P. Mélinon, G. Fuchs, B. Cabaud, A. Hoareau, P. Jensen, V. Paillard and M. Treilleux

Département de Physique des Matériaux ( Unité associé au CNRS ), Université Claude Bernard-Lyon I, 43 Bd du 11 Novembre 1918, 69622 Villeurbanne Cedex, France

(Received 23 December 1992, accepted in final form 24 March 1993)

Physical and chemical properties of films prepared by Low-Energy Cluster Beam Deposition (LECBD) are presented, discussed and compared to those of films obtained by other conventional deposition techniques. LECBD films are formed by the stacking of individual grains corresponding roughly to the incident free clusters. This original structure suggests that LECBD is promising for technological and theoretical applications. Film properties strongly related to the mean grain size can be controlled with this original technique. This work shows several examples showing the assets of LECBD : ultrathin sintered films, high surface-volume ratio or continuous ultrathin films, new structures of metallic deposits. Used as a tool to obtain experimental data to study fractal 2D models or to elaborate deposits to study quantum size effects, this deposition technique would be original, efficient and sometimes essential in many research areas.

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