| Numéro |
J. Phys. I France
Volume 3, Numéro 7, July 1993
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|---|---|---|
| Page(s) | 1585 - 1603 | |
| DOI | https://doi.org/10.1051/jp1:1993202 | |
J. Phys. I France 3 (1993) 1585-1603
Low-energy cluster beam deposition : do you need it ?
P. Mélinon, G. Fuchs, B. Cabaud, A. Hoareau, P. Jensen, V. Paillard and M. TreilleuxDépartement de Physique des Matériaux ( Unité associé au CNRS ), Université Claude Bernard-Lyon I, 43 Bd du 11 Novembre 1918, 69622 Villeurbanne Cedex, France
(Received 23 December 1992, accepted in final form 24 March 1993)
Abstract
Physical and chemical properties of films prepared by Low-Energy Cluster Beam Deposition (LECBD) are presented, discussed
and compared to those of films obtained by other conventional deposition techniques. LECBD films are formed by the stacking
of individual grains corresponding roughly to the incident free clusters. This original structure suggests that LECBD is promising
for technological and theoretical applications. Film properties strongly related to the mean grain size can be controlled
with this original technique. This work shows several examples showing the assets of LECBD : ultrathin sintered films, high
surface-volume ratio or continuous ultrathin films, new structures of metallic deposits. Used as a tool to obtain experimental
data to study fractal 2D models or to elaborate deposits to study quantum size effects, this deposition technique would be
original, efficient and sometimes essential in many research areas.
© Les Editions de Physique 1993